Laboratories

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LABORATORY OF SCANNING ELECTRON MICROSCOPY (L-4)

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Authorisation:

Accredited activity is defined in the Scope of Accreditation No. AB 120



Address:

Aleksander Krupkowski Institute

of Metallurgy and Materials Science,

Polish Academy of Sciences,

25, Reymonta Str., 30-59 Kraków,

phone: (48)(12) 295 28 00,

fax: (48)(12) 295 28 04,

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Head of Laboratory:

Associate Prof. Marek Faryna PhD, DSc, Eng. ( Adres poczty elektronicznej jest chroniony przed robotami spamującymi. W przeglądarce musi być włączona obsługa JavaScript, żeby go zobaczyć. )

Experts: 

 Elżbieta Bielańska, PhD

Anna Rakowska, PhD, Eng.

Anna Sypień, PhD, Eng.

Joanna Wojewoda – Budka PhD

Anna Janus - MSc, Eng.

The laboratory carries out research using two electron microscopes:

1. Scanning electron microscope FEI E-SEM XL30 equipped with energy dispersive X-ray spectrometer EDAX GEMINI 4000 used for the observation of sample surface in controlled vacuum.



Characteristics of the microscope:

- point resolution: 3.5 nm at 30kV, 30 nm at 1 kV;

- range of accelerating voltages: 200 V – 30 kV;

- range of magnifications: 10 X – 500 000 X at WD=10mm;

- range of gas pressures: 0 – 20 Torr;

- detection of secondary electrons and back scattered electrons in COMPO and TOPO system.

 

 

 

 



 

 

 

 

 

 

 

Characteristics of the spectrometer:
Spectrometer EDXS Genesis 4000 of EDAX firm is equipped in Si(Li) detector with SUTW window of resolution ≤ 133; provides the detection of all elements from B up. EDAX system controls electron beam in E-SEM XL 30 in order to carry out acquisition of images and maps through its scanning generator. 


 

 

 

 

E-SEM+EDXS instrument is used for the general quantitative and qualitative analysis on microareas of either dielectrics and organic materials or conductive samples.

2. Scanning electron microscope PHILIPS XL30 and energy dispersive X-ray spectrometer LINK ISIS, Oxford Instrument.

 

 

The XL30 Scanning Electron Microscope (SEM) manufactured by FEI Philips Electron Optics, The Netherlands, is used for surface observations of a wide range of solid samples. A guaranteed point resolution of 3.5 nm at 30 kV and 30 nm at 1 kV is to be achieved; the continuously variable accelerating voltage covers the range from 0.2 kV to 30 kV and the magnification range changes from 10 x to 400.000 x. Scan modes are either full frame, reduced raster (beam scans in a limited area), horizontal line scan or spot mode.

An Everhart-Thornley detector with high efficiency long-life scintillator is used for secondary electrons collection while a solid state detector is employed to collect backscatter electrons both in COMPO and TOPO mode. Digital images can be recorded on FD and photo film or stored on HD. The XL software is fully MS Windows NT compatible. Application programs including MS Word, Excel and WordPerfect can be utilized for writing reports.

The XL 30 is equipped with an eucentric goniometer stage with specimen movement: X = 50 mm, Y = 50 mm, rotation x360o, tilt range: –15o + 75o and maximum free space Z (FWD – Free Working Distance) from 4 to 37 mm.

The EDX LINK ISIS dispersive X-ray spectrometer manufactured by Oxford Instruments, UK, fully integrated with the XL30, offers qualitative and quantitative elemental analysis of all elements down to boron (Z=5). Images, spectra and X-ray maps from analysed microareas can be acquired. Two data correction models are available on the EDX LINK ISIS: ZAF and PhiRoZet. The first model gives excellent results for elements Z>11, while the second model provides very good results for all elements, especially for the ultra light ones.

The X-ray Si(Li) Pentafet detector with energy resolution of 138 eV operates in three modes: with Beryllium window, with Ultra thin polymer window and in Windowless option for the ultimate in light element performance.


Sample preparation for investigations

The L-4 laboratory runs analyses on samples supplied by customers who have been previously informed about conditions concerning specimen preparation and size limits.

The size of sample should not exceed 50 mm diameter. Thickness and weight of the sample should be limited up to 25 mm and 250 g, respectively. The EDX analysis requires upper and bottom surfaces of the sample to be parallel. The analysed surface for quantitative measurements should be polished as flat and scratch-free as possible and in the unetched condition so as not to alter the topography or surface chemistry.

Samples are attached to specially designed holders by carbon conductive paint or double sided adhesive carbon tape. 

Persons interested in co-operation should contact:

The Head of the Laboratory L-4:

Marek Faryna PhD, DSc, Eng.

phone: (0-12) 295 28 28

e-mail: Adres poczty elektronicznej jest chroniony przed robotami spamującymi. W przeglądarce musi być włączona obsługa JavaScript, żeby go zobaczyć.


Results of selected experiments performed in the Laboratory of Microanalysis L-4

 

 

Surface of porous silicon, Secondary Electron Image, magnification 16.000x


Pierwiastek

%.wag.

%.at.

Al Kα

1.1

2.8

Ti Kα

17.7

25.9

Ni Kα

17.8

21.2

Cu Kα

11.7

12.9

Zr Lα

31.2

23.9

Ag Lα

20.5

13.3

Razem:

100.0

100.0


Qualitative and quantitative analysis of eutectic in the TiZrAgCuNi alloy, ZAF correction.


Examples:


Resolution Image

SE Image

BSE Image



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